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Effect of yttrium ion implantation on the oxidation of alumina formers at 1173 K

R. Cueff, H. Buscail, E. Caudron, F. Riffard, C. Issartel and S. El Messki

Matériaux & Techniques, 91 7-8-9 (2003) 93-98

DOI: https://doi.org/10.1051/mattech/200391070093

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